| 摘要 |
PURPOSE: A chamber cleaning apparatus is provided to control a cleaning process by monitoring a cleaning degree of a process for cleaning non-plasma type chamber by a laser end point detector. CONSTITUTION: A thin film is deposited on a placed wafer by the energy applied as a heat source while deposition gas is inserted into a chamber(21). A laser light source(23) generates laser, installed in the chamber. A reflection plate(25) reflects the laser irradiated by the laser light source, installed in the chamber. A laser detecting unit(27) irradiates the laser reflected by the reflection plate, installed in the chamber. A fluorinator(33) injects fluorine to the inside of the chamber, connected to the chamber. A PMT(photo multiple tube)(29) is connected to the laser detecting unit by an optical fiber. A controller(31) controls a cleaning degree of the thin film according to the strength of the laser irradiated to the PMT, connected to the PMT and the chamber.
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