发明名称 DISPLAY APPARATUS AND METHOD OF MANUFACTURING SAME
摘要 PROBLEM TO BE SOLVED: To avoid a situation that an interface level of an insulation film for with respect to a polysilicon layer becomes high and that the fixed electric charges in the insulation film increase, in a thin film transistor. SOLUTION: In the display apparatus comprising a thin film transistor over an insulating substrate, the thin film transistor comprises a semiconductor layer, a gate electrode, and a gate insulating film provided between the semiconductor layer and the gate electrode, and the gate insulating film includes at least single deposition film deposited by the deposition method. Moreover, the gate insulating film has distribution in the concentration of carbon in the area nearer to the semiconductor layer which becomes smaller than that in the side far from the semiconductor layer without any other deposition film deposited by the deposition method for the semiconductor layer. COPYRIGHT: (C)2004,JPO&NCIPI
申请公布号 JP2004253520(A) 申请公布日期 2004.09.09
申请号 JP20030040812 申请日期 2003.02.19
申请人 HITACHI DISPLAYS LTD 发明人 KAMO NAOHIRO;ITOGA TOSHIHIKO;KAITO TAKUO;OKURA OSAMU
分类号 G02F1/1368;C23C16/455;H01L21/316;H01L21/336;H01L21/77;H01L21/84;H01L27/12;H01L29/49;H01L29/786;H01L51/50;(IPC1-7):H01L29/786;G02F1/136;H05B33/14 主分类号 G02F1/1368
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