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发明名称
RETAINER AND WAFER POLISHING APPARATUS
摘要
申请公布号
KR20060010887(A)
申请公布日期
2006.02.03
申请号
KR20040059473
申请日期
2004.07.29
申请人
KABUSHIKI KAISHA TOSHIBA
发明人
MASUNAGA TAKAYUKI;OOFUCHI SHINOBU
分类号
H01L21/304
主分类号
H01L21/304
代理机构
代理人
主权项
地址
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