发明名称 |
Silicon carbide schottky diode |
摘要 |
A SiC Schottky diode which includes a Schottky barrier formed on a silicon face 4H—SiC body. |
申请公布号 |
US9627553(B2) |
申请公布日期 |
2017.04.18 |
申请号 |
US201313759872 |
申请日期 |
2013.02.05 |
申请人 |
SILICONIX TECHNOLOGY C.V. |
发明人 |
Richieri Giovanni |
分类号 |
H01L29/47;H01L29/872;H01L29/16 |
主分类号 |
H01L29/47 |
代理机构 |
|
代理人 |
|
主权项 |
1. A semiconductor device, comprising:
a SiC substrate; a silicon face SiC epitaxial body formed on a first surface of a said SiC substrate; a Schottky metal barrier formed on said silicon face of said SiC epitaxial body; and a back power electrode on a second surface of said SiC substrate wherein said Schottky metal barrier is configured to exhibit a voltage characterization of the barrier that reflects uniformity between said Schottky metal barrier and said silicon. |
地址 |
Singapore SG |