| 发明名称 |
CLEANING COMPOSITION AND METHOD FOR PROCESSING EQUIPMENT |
| 摘要 |
An aqueous cleaning solution composition includes about 8.7 wt. % to about 10.7 wt. % sodium hydroxide and about 0.7 wt. % to about 1.1 wt. % of potassium sodium tartrate. |
| 申请公布号 |
US2016312159(A1) |
申请公布日期 |
2016.10.27 |
| 申请号 |
US201615139521 |
申请日期 |
2016.04.27 |
| 申请人 |
Seacole-CRC, LLC |
发明人 |
Athneil Benjamin K. |
| 分类号 |
C11D7/26;B08B9/027;B08B9/08;C11D7/06 |
主分类号 |
C11D7/26 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An aqueous cleaning solution composition comprising:
about 8.7 wt. % to about 10.5 wt. % sodium hydroxide; and about 0.7 wt. % to about 1.1 wt. % potassium sodium tartrate. |
| 地址 |
Plymouth MN US |
