| 发明名称 |
MASK DEVICE, EXPOSURE APPARATUS AND EXPOSURE METHOD |
| 摘要 |
Embodiments of the present disclosure provide a mask device, an exposure apparatus and an exposure method, which enable a reduction in the possibility that the mask is scratched during exposure so as to protect the mask, and in turn a reduction in production cost of the semiconductor devices. The mask device comprises a mask carrier, a mask disposed on a lower surface of the mask carrier, and at least one protection unit provided on the mask carrier, wherein a lower end of the at least one protection unit is arranged to be lower than the lower surface of the mask during exposure. The mask device is applicable in exposure of a substrate to be exposed. |
| 申请公布号 |
US2016349630(A1) |
申请公布日期 |
2016.12.01 |
| 申请号 |
US201514912801 |
申请日期 |
2015.07.22 |
| 申请人 |
BOE TECHNOLOGY GROUP CO., LTD. ;HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD |
发明人 |
Wu Bin;Yu Zhongxing |
| 分类号 |
G03F7/20;G03F1/50 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A mask device, comprising a mask carrier and a mask disposed on a lower surface of the mask carrier, wherein the mask device further comprises at least one protection unit provided on the mask carrier, and wherein a lower end of the at least one protection unit is arranged to be lower than a lower surface of the mask during exposure. |
| 地址 |
Beijing CN |
