Pixel wall and spacer configuration for an electrowetting display

摘要

A method for fabricating an electrowetting display may include depositing a first material layer on a support plate; placing a first mask on the first material layer, wherein the first mask covers first portions of the first material layer and does not cover second portions of the first photoresist layer; exposing second portions of the first material layer to electromagnetic radiation; depositing a second material layer on the first mask and the exposed second portions of the first material layer; placing a second mask on the second material layer; and etching to remove portions of the second material layer and the second portions of the first material layer. Portions of the first and second material layers that remain subsequent to the etching form spacers and a grid of pixel wall extensions.

主权项

1. A method for fabricating an electrowetting display, the method comprising:
depositing a first photoresist layer on a transparent support plate, wherein the transparent support plate includes a substrate and at least one pixel electrode; placing a first mask on the first photoresist layer, wherein the first mask covers first portions of the first photoresist layer and does not cover second portions of the first photoresist layer; exposing the second portions of the first photoresist layer to electromagnetic radiation; depositing a second photoresist layer on the first mask and the second portions of the first photoresist layer; placing a second mask on the second photoresist layer, wherein the second mask covers first portions of the second photoresist layer and does not cover second portions of the second photoresist layer; exposing the second portions of the second photoresist layer to electromagnetic radiation; and etching to remove the second portions of the second photoresist layer and the second portions of the first photoresist layer, wherein the first portions of the second photoresist layer that remain subsequent to the etching form a grid of pixel wall extensions, and wherein the first portions of the first photoresist layer that remain subsequent to the etching form spacers that extend from the transparent support plate to the grid of pixel wall extensions.