发明名称 DEVELOPING SOLUTION FOR O-QUINONE DIAZIDE PHOTOSENSITIVE MATERIAL
摘要 PURPOSE:To increase the developing stability without lowering the developing power and solve problems about the treatment of waste liquor by using an aqueous alkali soln. contg. a water soluble amphoteric polyelectrolyte as a developing soln. for an o-quinone diazide photosensitive material. CONSTITUTION:An amphoteric polyelectrolyte contg. an anionic group selected from COOH and SO3H, tertiary amine, quat, ammonium salt, cyclic amine and cyclic quat. ammonium salt is used as a developer for an o-quinone diazide photosensitive material. The polyelectrolyte includes a copolymer of monomers selected from a monomer having an anionic group such as styrene sulfonate or (meth) acrylate, a monomer having a cationic group and obtd. by the reaction of vinylpyridine, diallylamine and a quaternizing agent, and other monomers. The polyelectrolyte is added to an aqueous soln. of sodium silicate, NaOH, sodium tertiary phosphate or other alkali to prepare a developing soln. This soln. has high developing power and high stability in image reproduction even in long-time development at high temp. In addition, problems about the treatment of waste liquor such as the production of much silicic acid gel are solved.
申请公布号 JPS56142528(A) 申请公布日期 1981.11.06
申请号 JP19800045986 申请日期 1980.04.08
申请人 MITSUBISHI CHEM IND 发明人 KIKUCHI SENJI;TORIGE KAZUO;KAMATA OSAMU
分类号 G03F7/00;G03C1/72;G03F7/30;G03F7/32 主分类号 G03F7/00
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