发明名称 |
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD |
摘要 |
Provided is a substrate processing apparatus. The substrate processing apparatus includes a lower chamber having an opened upper side, an upper chamber opening or closing the upper side of the lower chamber, the upper chamber defining an inner space, in which a process is performed on a substrate, together with the lower chamber, a showerhead disposed on a lower portion of the upper chamber to supply a reaction gas toward the inner space, wherein a buffer space is defined between the showerhead and the upper chamber, a partition member disposed in the buffer space to partition the buffer space into a plurality of diffusion regions, and a plurality of gas supply ports disposed in the upper chamber to supply the reaction gas toward each of the diffusion regions. |
申请公布号 |
US2016289831(A1) |
申请公布日期 |
2016.10.06 |
申请号 |
US201415038672 |
申请日期 |
2014.12.10 |
申请人 |
EUGENE TECHNOLOGY CO., LTD. |
发明人 |
JE Sung-Tae;JANG Gil Sun;YUN Chang-Hoon;KIM Kyong-Hun |
分类号 |
C23C16/455;C23C16/44;C23C16/52;C23C16/458 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate processing apparatus comprising:
a lower chamber having an opened upper side; an upper chamber opening or closing the upper side of the lower chamber, the upper chamber defining an inner space, in which a process is performed on a substrate, together with the lower chamber; a showerhead disposed on a lower portion of the upper chamber to supply a reaction gas toward the inner space, wherein a buffer space is defined between the showerhead and the upper chamber; a partition member disposed in the buffer space to partition the buffer space into a plurality of diffusion regions; and a plurality of gas supply ports disposed in the upper chamber to supply the reaction gas toward each of the diffusion regions. |
地址 |
Yongin-si, Gyeonggi-do KR |