METHOD AND APPARATUS FOR DEPOSITING A PIECE OF BAND-LIKE ELASTOMERIC ELEMENT ON A FORMING SUPPORT IN A PROCESS FOR BUILDING A TYRE FOR VEHICLE WHEELS

摘要

A method for depositing a piece of band-like elastomeric element on a forming support in a process for building a tyre for vehicle wheels. The method includes feeding a piece of band-like elastomeric element having a predetermined nominal length towards the forming support along a predetermined feeding direction and measuring the actual length of the piece along the feeding direction. If the actual length is lower than or equal to a circumferential length of a deposition surface defined on the forming support, the piece is deposited on the deposition surface while the forming support rotates about a rotation axis thereof. During such deposition the piece is pressed on the deposition surface with a pressing force selected as a function of the actual length.

主权项

1. A method for depositing a piece of band-like elastomeric element on a forming support in a process for building a tyre for vehicle wheels, comprising:
feeding a piece of band-like elastomeric element having a predetermined nominal length towards said forming support along a predetermined feeding direction measuring an actual length of said piece of band-like elastomeric element along said feeding direction; if said actual length is lower than or equal to a circumferential length of a deposition surface defined on the forming support, depositing said piece of band-like elastomeric element on said deposition surface while said forming support rotates about a rotation axis thereof; if said actual length is lower than said circumferential length of said deposition surface, during the deposition of said piece of band-like elastomeric element on said deposition surface pressing said piece of band-like elastomeric element on said deposition surface with a pressing force selected as a function of said actual length and such as to stretch said piece so that, at the end of the deposition of said piece, said actual length substantially coincides with said circumferential length of said deposition surface.