SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

摘要

The temperature of a chemical liquid supplied to a pot is detected while allowing a processing liquid discharge port to discharge the chemical liquid toward the pot at a pre-dispensing position. The temperature of the chemical liquid rises in response to the lapse of time. When the temperature of the chemical liquid supplied to the pot reaches a second target temperature, the processing liquid discharge port is allowed to stop the discharge of the chemical liquid. Thereafter, a positional relationship between the processing liquid discharge port and the pot is changed, and the processing liquid discharge port is allowed to discharge the chemical liquid toward the substrate at the processing position.

主权项

1. A substrate processing apparatus comprising:
a discharge port that discharges a processing fluid that processes a substrate; a supply passage that guides the processing fluid to the discharge port; a discharge valve interposed in the supply passage; a substrate holding unit that rotates the substrate to be processed by the processing fluid discharged from the discharge port while horizontally holding the substrate; a pot that receives the processing fluid discharged from the discharge port; a position changing unit that changes a positional relationship between the discharge port and the pot between a processing position at which the processing fluid discharged from the discharge port is supplied to the substrate held by the substrate holding unit and a pre-dispensing position at which the processing fluid discharged from the discharge port is supplied to the pot; a downstream temperature detection unit that detects a temperature of the processing fluid supplied from the discharge port to the pot; and a controller that controls the discharge valve and the position changing unit, wherein the controller performs: a first step of allowing the discharge port to discharge the processing fluid at the pre-dispensing position at which the processing fluid discharged from the discharge port is supplied to the pot by opening the discharge valve interposed in the supply passage that guides the processing fluid to the discharge port that discharges the processing fluid that processes the substrate; a second step of detecting the temperature of the processing fluid discharged from the discharge port with the downstream temperature detection unit in parallel with the first step; a third step of, based on the temperature of the processing fluid detected in the second step, stopping supplying the processing fluid from the discharge port to the pot; and a fourth step of, after finishing the third step, allowing the discharge port to discharge the processing fluid at the processing position at which the processing fluid discharged from the discharge port is supplied to the substrate held by the substrate holding unit.