发明名称 HETEROGENEOUS POCKET FOR TUNNELING FIELD EFFECT TRANSISTORS (TFETS)
摘要 Embodiments of the disclosure described herein comprise a tunneling field effect transistor (TFET) having a drain region, a source region having a conductivity type opposite of the drain region, a channel region disposed between the source region and the drain region, a gate disposed over the channel region, and a heterogeneous pocket disposed near a junction of the source region and the channel region. The heterogeneous pocket comprises a semiconductor material different than the channel region, and comprises a tunneling barrier less than the bandgap in the channel region and forming a quantum well in the channel region to in crease a current through the TFET transistor when a voltage applied to the gate is above a threshold voltage.
申请公布号 US2016276440(A1) 申请公布日期 2016.09.22
申请号 US201315037296 申请日期 2013.12.23
申请人 INTEL CORPORATION 发明人 Avci Uygar E.;KOTLYAR Roza;DEWEY Gilbert;CHU-KUNG Benjamin;YOUNG Ian A.
分类号 H01L29/12;H01L29/205;H01L29/165;G11C5/06;H01L29/78;H01L29/06 主分类号 H01L29/12
代理机构 代理人
主权项 1. A tunneling field effect transistor (TFET) comprising: a drain region; a source region having a conductivity type opposite of the drain region; a channel region disposed between the source region and the drain region; a gate disposed over the channel region; and a heterogeneous pocket disposed near a junction of the source region and the channel region, wherein the heterogeneous pocket comprises a semiconductor material different than the channel region, and wherein the heterogeneous pocket comprises a lower tunneling barrier than a bandgap of the channel region to form a quantum well to increase a current through the TFET transistor when a voltage applied to the gate is above a threshold voltage.
地址 Snata Clara CA US
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