| 摘要 |
PURPOSE:To obtain a relief type contact reversal lith film of the sensitive material composed of a non-silver salt having a high inverted register accuracy by arranging a mask layer and a photoresist layer in order on a mat layer provided on the mat film substrate which has >=60% total transmission factor and also 0.1-0.60mu center line average roughness in at least 330-600nm wave length range. CONSTITUTION:The transparent substrate is preferably a polyethylene terephthalate having 50-200mu thickness. The mat layer has preferably 0.1-20mu a thickness of the coated film. The film proved on the mat layer is necessary to be >=60% total transmission factor in at least 330-600nm wavelength range and also 0.1-0.60mu center line average roughness. In <0.1mu roughness of the film, a surface smoothness and a suction fitness are substantially the same to those of an usual transparent film. In >=60mu roughness, an undesired phenomena such as a generation of a matrix fog in a nonimage part of the inverted image, and a depression of a sharpness in the inverted image occur. |
