发明名称 PHOTOSENSITIVE MATERIAL FOR DIFFUSION TRANSFER
摘要 PURPOSE:To obtain a photosensitive material for diffusion transfer having superior adhesion resistance and an antistatic property by incorporating fine particles of a polymer having repeating units of a monomer contg. at least one fluorine atom (polymer contg. fluorine) into at least one of the outermost layers among the photosensitive elements of a photosensitive material for diffusion transfer. CONSTITUTION:At least one photosensitive silver halide emulsion layer and a protective surface layer are formed on one side of a support, and a nonphotosensitive layer (backing layer) is formed on the other side to obtain a photosensitive material for diffusion transfer. At this time, a matting agent made of a polymer contg. fluorine is preferably incorporated into the protective surface layer as the outermost layer on the emulsion layer side. When the backing layer is composed of two or more layers, the layer positioned farthest from the support is the outermost layer on the backing layer side.
申请公布号 JPS61153636(A) 申请公布日期 1986.07.12
申请号 JP19840276538 申请日期 1984.12.27
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 GOTO SOHEI;KOBAYASHI TATSUHIKO;TACHIBANA NORIKI
分类号 G03C7/00;G03C8/08;G03C8/52 主分类号 G03C7/00
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