发明名称 |
MODEL FOR ACCURATE PHOTORESIST PROFILE PREDICTION |
摘要 |
A photoresist modelling system includes a mathematical model for a photolithography process. The mathematical model may be executable using a computer processor. The mathematical model may be used to model a photoresist as formed on a semiconductor wafer surface. A blocked polymer concentration gradient equation may be implemented into the mathematical model. The blocked polymer concentration gradient equation may describe an initial concentration gradient of a blocked polymer in the photoresist being modelled by the mathematical model. |
申请公布号 |
SG11201606847Y(A) |
申请公布日期 |
2016.10.28 |
申请号 |
SG11201606847Y |
申请日期 |
2015.03.16 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
SMITH, MARK D.;BIAFORE, JOHN J. |
分类号 |
H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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