| 摘要 |
<p>PURPOSE:To reduce the resistance of a wiring electrode by putting the pattern of a base conduction diagram behind the pattern of lower metal at the part where an MIM element is present, and further making an insulator layer at the periphery of the base conduction diagram thicker than the insulator of the MIM element. CONSTITUTION:The lower metal 14 of a nonlinear resistance element in electrically connected metal-insulator-metal(MIM) element structure on a side closer to a substrate 10 is formed by interposing a base conductive layer 15 which is lower in specific resistance than the lower metal 14 between the lower metal and substrate 10, the pattern of this base conductive layer 15 is put behind the pattern of the lower metal 14 at the part where the MIM element is present, and the insulator layer 17 is formed at the periphery of the lower conductive layer 15. The insulator layer 17 is thicker than the insulator 16 of the MIM element. Therefore, a current which flows through the insulator layer 17 at the periphery of the base conductive layer 15 becomes extremely small. Consequently, the resistance of the wiring electrode for applying a signal from outside is reducible without spoiling the current-voltage characteristics of the MIM element.</p> |
