发明名称 TREATMENT SYSTEM
摘要 This treatment system is provided with one or more treatment units (20). Each of the treatment units (20) has a plurality of treatment chambers (22), and a utility module (30). Each of the treatment chambers (22) treats, using a supplied treatment gas, a subject to be treated. The utility module (30) includes a flow rate control unit (31) that controls the flow rate of the treatment gas to be supplied to each of the treatment chambers (22). The treatment chambers (22) are disposed by overlapping each other in the vertical direction. The utility module (30) is disposed between two treatment chambers (22) adjacent to each other in the vertical direction, said two treatment chambers being among the treatment chambers (22).
申请公布号 WO2016185984(A1) 申请公布日期 2016.11.24
申请号 WO2016JP64066 申请日期 2016.05.11
申请人 TOKYO ELECTRON LIMITED 发明人 TANIFUJI, Tamotsu;YUASA, Tamaki;KAWAKAMI, Satoru
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
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