发明名称 |
Method for fabricating semiconductor integrated circuit device using an electrode wiring structure |
摘要 |
In a CVD contact formed on a shallow junction having a depth of 0.2 micron or less, the presence of aluminum generates a leakage current at the junction after heat treatment. In order to restrain the leakage current, a barrier metal is formed below the aluminum electrode to form an Al/barrier metal/CVDW (tungsten) structure. A contact free from junction leakage and having a high aspect ratio is thereby realized.
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申请公布号 |
US5104826(A) |
申请公布日期 |
1992.04.14 |
申请号 |
US19900470579 |
申请日期 |
1990.01.26 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
FUJITA, TSUTOMU;FUJII, TOYOKAZU |
分类号 |
H01L23/52;H01L21/28;H01L21/285;H01L21/3205;H01L21/768;H01L23/532 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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