| 摘要 |
A temperature control system is used in conjunction with sputtering, CDV, etching, and the like apparatuses for processing a substrate on which semiconductor devices are integrated. This system responds quickly to any change in the temperature of the substrate being processed, by heating or cooling the substrate to an appropriate temperature and maintaining it constant at such temperature. The heating is accomplished by radiant heaters which heat a gas flowing through the apparatus, which in turn transfers heat to the substrate mounted on the apparatus.
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