| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate for manufacturing an imprint mold having a mesa structure with high accuracy, and a method for manufacturing an imprint mold.SOLUTION: A substrate 11 for manufacturing an imprint mold is configured to include a base part 13 integrally having a projection structure 14 projecting from one surface, and a hard mask material layer 17 located to cover an upper flat surface of the projection structure 14 as well as located in at least a part of a sidewall surface 14b of the projection structure 14. The hard mask material layer 17 is formed by depositing, from the projection structure 14 side, a first layer 17a comprising a metal or a metal compound and a second layer 17b comprising silicon or a silicon compound in this order. The hard mask material layer 17 located on the upper flat surface of the projection structure 14 is configured to be continuous with the hard mask material layer 17 located on the sidewall surface 14b at a peripheral edge of the upper flat surface.SELECTED DRAWING: Figure 3 |
