<p>An electron beam apparatus is provided with an energy selective device enabling energy selective measurings together with imaging. The energy selective device has its main electron trajectory in a plane outside the optical axis of the electron beam apparatus restricting the additive length of the apparatus substantially. Preferably the energy selective device shows double symmetry such that the energy dispersion has a maximum value in a central plane of symmetry where a selective slit can be introduced. Full symmetry facilitates full compensation of optical aberrations int he filter. Adding quadrupoles in a second plane of symmetry enables imaging of spectra outside the filter.</p>
申请公布号
EP0538938(A1)
申请公布日期
1993.04.28
申请号
EP19920203162
申请日期
1992.10.15
申请人
N.V. PHILIPS' GLOEILAMPENFABRIEKEN
发明人
ROSE, HARALD;DEGENHARDT, RALF;VAN DER MAST, KAREL D.