CONTROLLING APPARATUS OF DISTANCE BETWEEN PARALLEL ELECTRODS

摘要

The unit adjusts an accurate distance between two electrodes of the planar plasma reactor in the semiconductor wafer manufacturing unit. To eliminate planar gap inconsistency and contamination problems, the unit employs the optical interfernce meter's theory and is constructed to include: a light beam splitter (13) and a reflection plate (14A) installed in line with a light source (11), but in inclination; a light detector (15) installed at the rear side of beam splitter (13); a plasma reactor (20) equipped with the splitter (13) and the second third reflection unit (14B, 14C) to convert light emitted from the light source (11) into interferenced light to measure distances between the planes.