发明名称 SYSTEMS AND METHODS FOR REDUCING PULSED LASER BEAM PROFILE NON-UNIFORMITY FOR LASER ANNEALING
摘要 PROBLEM TO BE SOLVED: To reduce pulsed laser beam profile non-uniformity for laser annealing.SOLUTION: The methods include directing an initial pulsed laser beam along an optical axis, and imparting to each light pulse a time-varying angular deflection relative to the optical axis. This forms a new laser beam, and each light pulse is deflected by an amount of spatial deflection δ sufficient to reduce the micro-scale intensity variations in the laser beam. The new laser beam is then used to form a line image, which has better intensity uniformity than a line image formed using the initial laser beam.SELECTED DRAWING: None
申请公布号 JP2016178305(A) 申请公布日期 2016.10.06
申请号 JP20160056116 申请日期 2016.03.18
申请人 ULTRATECH INC 发明人 WANG YUN
分类号 H01L21/268;H01S3/00;H01S3/10;H01S3/101 主分类号 H01L21/268
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