| 摘要 |
<p>A system and a method for washing objects, such as cassettes and carriers used to hold and transport silicon wafers during manufacture of semiconductor chips. The method employs the steps of exposing the objects to ultraviolet radiation in a process chamber, spraying of developer fluid onto the objects, rinsing the objects, spraying of surfactant solution onto the objects, rinsing the objects and drying the objects using heated, filtered and ionized ultra low particle air (ULPA) <IMAGE></p> |
