发明名称 |
Energy-sensitive materials and methods for their use. |
摘要 |
<p>A class of silicon-containing materials display excellent sensitivity in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. Materials are depositable from the vapor phase and show excellent promise for use such as resists in the fabrication of electronic and optical devices.</p> |
申请公布号 |
EP0670522(A1) |
申请公布日期 |
1995.09.06 |
申请号 |
EP19950300938 |
申请日期 |
1995.02.15 |
申请人 |
AT&T CORP. |
发明人 |
JOSHI, AJEY MADHAV;WEIDMAN, TIMOTHY WILLIAM |
分类号 |
C08G77/60;C08G77/48;G03F7/039;G03F7/075;G03F7/16;H01L21/027;G03F7/20;G03F7/26;G03F7/36;G03F7/38;H01L21/30;H01L21/302;H01L21/3065;(IPC1-7):G03F7/075 |
主分类号 |
C08G77/60 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|