发明名称 Energy-sensitive materials and methods for their use.
摘要 <p>A class of silicon-containing materials display excellent sensitivity in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. Materials are depositable from the vapor phase and show excellent promise for use such as resists in the fabrication of electronic and optical devices.</p>
申请公布号 EP0670522(A1) 申请公布日期 1995.09.06
申请号 EP19950300938 申请日期 1995.02.15
申请人 AT&T CORP. 发明人 JOSHI, AJEY MADHAV;WEIDMAN, TIMOTHY WILLIAM
分类号 C08G77/60;C08G77/48;G03F7/039;G03F7/075;G03F7/16;H01L21/027;G03F7/20;G03F7/26;G03F7/36;G03F7/38;H01L21/30;H01L21/302;H01L21/3065;(IPC1-7):G03F7/075 主分类号 C08G77/60
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