发明名称 Substrate processing apparatus
摘要 A substrate processing apparatus includes an indexer block, a first processing block, a second processing block, and an interface block. The indexer block includes a pair of carrier platforms and a transport section. A carrier storing a plurality of substrates in multiple stages is placed in each of the carrier platforms. The transport section includes transport mechanisms. The transport mechanisms concurrently transport the substrates.
申请公布号 US9494877(B2) 申请公布日期 2016.11.15
申请号 US201213416830 申请日期 2012.03.09
申请人 SCREEN Semiconductor Solutions Co., Ltd. 发明人 Nishimura Kazuhiro;Nakamura Yasushi;Kawamatsu Yasuo;Chikamori Ryuichi
分类号 G03B27/42;G03B27/58;G03B27/62;G03F7/20;H01L21/67;H01L21/677 主分类号 G03B27/42
代理机构 Ostrolenk Faber LLP 代理人 Ostrolenk Faber LLP
主权项 1. A substrate processing apparatus comprising: an indexer block into and out of which a storage container that stores a plurality of substrates is carried; and a processing block that subjects the substrates to predetermined processing, wherein said indexer block includes a container platform on which said storage container is placed, and first and second transport mechanisms that concurrently transport the substrates between said storage container placed on said container platform and said processing block, wherein said container platform includes first and second platforms, a storage container that stores the substrates before said processing is placed on said first platform, a storage container for storing the substrates after said processing is placed on said second platform, said first transport mechanism is configured to transport the substrates before said processing from said storage container placed on said first platform to said processing block, said second transport mechanism is configured to transport the substrates after said processing from said processing block to said storage container placed on said second platform, said first transport mechanism includes first and second holders that are arranged adjacent to each other in a vertical direction and configured to hold the substrates respectively, while keeping a distance between said first and second holders in the vertical direction constant, said storage container that stores the substrates before said processing has a plurality of shelves that are arranged in the vertical direction and on which the substrates are placed, said first transport mechanism is configured to receive two substrates at a time, which are placed respectively on an arbitrary pair of shelves of said plurality of shelves in said storage container that stores the substrates before said processing, using said first and second holders, said arbitrary pair of shelves being selected such that at least another one of the plurality of shelves is positioned between the pair of shelves, and said first transport mechanism is configured to receive two substrates at a time from said arbitrary pair of shelves, with at least one additional substrate being disposed on said at least another one of the plurality of shelves between said arbitrary pair of shelves.
地址 JP