发明名称 |
TABLE FOR HOLDING PROCESSING OBJECT AND PROCESSING DEVICE HAVING THE TABLE |
摘要 |
PROBLEM TO BE SOLVED: To prevent a treatment liquid as much as possible from being sucked into small holes of a table intended to vacuum-suction a substrate.SOLUTION: There is provided a wet-type substrate processing device for processing a substrate. The wet-type substrate processing device includes: a table for holding the substrate; and a treatment liquid feeding mechanism for feeding a treatment liquid to the substrate held by the table. The table includes: a support surface for supporting the substrate; first aperture parts formed in the support surface; second aperture parts formed in the support surface and disposed so as to at least partly surround the first aperture parts; a first fluid channel extending through the table to the first aperture parts of the support surface and constituted to be connectable to a vacuum source; and a second fluid channel extending through the table to the second aperture parts of the support surface and constituted to drain the treatment liquid.SELECTED DRAWING: Figure 3A |
申请公布号 |
JP2016221668(A) |
申请公布日期 |
2016.12.28 |
申请号 |
JP20160096276 |
申请日期 |
2016.05.12 |
申请人 |
EBARA CORP |
发明人 |
TOYOMURA NAOKI;MIYAZAKI MITSURU;KUNISAWA JUNJI |
分类号 |
B24B37/30;H01L21/304;H01L21/683 |
主分类号 |
B24B37/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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