发明名称 TABLE FOR HOLDING PROCESSING OBJECT AND PROCESSING DEVICE HAVING THE TABLE
摘要 PROBLEM TO BE SOLVED: To prevent a treatment liquid as much as possible from being sucked into small holes of a table intended to vacuum-suction a substrate.SOLUTION: There is provided a wet-type substrate processing device for processing a substrate. The wet-type substrate processing device includes: a table for holding the substrate; and a treatment liquid feeding mechanism for feeding a treatment liquid to the substrate held by the table. The table includes: a support surface for supporting the substrate; first aperture parts formed in the support surface; second aperture parts formed in the support surface and disposed so as to at least partly surround the first aperture parts; a first fluid channel extending through the table to the first aperture parts of the support surface and constituted to be connectable to a vacuum source; and a second fluid channel extending through the table to the second aperture parts of the support surface and constituted to drain the treatment liquid.SELECTED DRAWING: Figure 3A
申请公布号 JP2016221668(A) 申请公布日期 2016.12.28
申请号 JP20160096276 申请日期 2016.05.12
申请人 EBARA CORP 发明人 TOYOMURA NAOKI;MIYAZAKI MITSURU;KUNISAWA JUNJI
分类号 B24B37/30;H01L21/304;H01L21/683 主分类号 B24B37/30
代理机构 代理人
主权项
地址