Method for exposing an object, e.g. a photoresist layer to a substantially parallel light

摘要

The method involves exposing a mask (1) obliquely to parallel light whilst continuously moving it backwards and forwards relative to an object (2) e.g. photo resist layer, by a small amount, e.g 5 -10 mm at a frequency of 0.1 up to 20 Hz. This results in interference strips or Newtons rings being guided off the exposed area so that they act as a background