| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that prevents a failure in a pattern profile even when a contact time with an alkali developer varies within a normally employed range in a developing process, a pattern forming method, a color filter and a display device.SOLUTION: The photosensitive resin composition comprises (A) an alkali-soluble resin, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, and (D) a silane coupling agent. The (A) alkali-soluble resin comprises a polymer containing a structural unit having a cyclic structure in the main chain; and the (D) silane coupling agent is a compound represented by formula (2): RRSi-R-NH-C(O)-Y-R-X.SELECTED DRAWING: None |
