| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a three-dimensional device structure by which a three-dimensional device structure is efficiently formed even when a face on which the structure is formed is sterical. SOLUTION: A stage for plotting a desired pattern on an object 1 to be coated with a film with an insulator soln., heating and drying the soln. to selectively form an insulating film 4 and a stage for plotting a desired pattern with a silane coupling agent, heating and drying the soln. to activate the surface and selectively forming a metallic film 5 by chemical plating are performed with a specified combination and order. At least a part of the insulating film 4 or the metallic film 5 is removed in a specified stage.
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