| 发明名称 |
Dibasic ester stripping composition |
| 摘要 |
A mixture of a dibasic ester (DBE), an alcohol, a polar solvent and water to remove photoresist from a flat panel substrate. Photoresist is effectively removed at low temperature with this non-phenolic, non-halogenated stripper solution.
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| 申请公布号 |
US6511547(B1) |
申请公布日期 |
2003.01.28 |
| 申请号 |
US20000661723 |
申请日期 |
2000.09.14 |
| 申请人 |
SILICONVALLEY CHEMLABS, INC. |
发明人 |
SAHBARI JAVAD J. |
| 分类号 |
C11D7/26;C11D7/50;G03F7/42;(IPC1-7):C23G1/00 |
主分类号 |
C11D7/26 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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