发明名称 |
Polymer spacers for creating small geometry space and method of manufacture thereof |
摘要 |
In forming an opening or space in a substrate, a layer of photoresist is provided on the substrate, and the photoresist is patterned to provide photoresist bodies having respective adjacent sidewalls. A polymer layer is provided on the resulting structure through a low temperature conformal CVD process. The polymer layer is anisotropically etched to form spacers on the respective adjacent sidewalls of the photoresist bodies. The substrate is then etched using the spacers as a mask.
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申请公布号 |
US6699792(B1) |
申请公布日期 |
2004.03.02 |
申请号 |
US20010907398 |
申请日期 |
2001.07.17 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
WANG FEI;YOU LU;OKADA LYNNE |
分类号 |
H01L21/027;H01L21/033;H01L21/311;H01L21/3213;(IPC1-7):H01L21/311 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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