Variable radius mirror dichroic beam splitter module for extreme ultraviolet source

摘要

A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.

主权项

1. An extreme ultraviolet radiation source comprising:
a droplet generator to provide a droplet; at least one laser source to provide a pre-pulse to irradiate the droplet so as to create a target droplet, the pre-pulse associated a pre-pulse focal plane, and to provide a main pulse to irradiate the target droplet into a plasma state, the main pulse associated with a main pulse focal plane; a dichroic splitter module to focus the pre-pulse and the main pulse, the dichroic splitter module comprising, at least one variable radius mirror; and a controller coupled to the at least one variable radius mirror to adjust a radius of curvature of the at least one variable radius mirror to adjust a distance between the pre pulse focal plane and the main pulse focal plane of the main pulse, the controller further setting the radius of curvature of the at least one variable radius mirror to an initial value based upon a desired value for a beam diameter of the main pulse at a specified distance from the pre-pulse focal plane, wherein setting the radius of curvature of the at least one variable radius mirror includes setting a pressure of a fluid applied to the at least one variable radius mirror.