PHOTOMASK REPAIRING METHOD, INSPECTION METHOD, INSPECTION DEVICE AND PHOTOMASK MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a pattern defect repairing device where a problem when a laser beam is adopted as a light source of an inspection device of a pattern defect, the defect of a pattern is inspected with higher resolution and the defect of the mask pattern can highly precisely be repaired.

SOLUTION: The device is provided with an illumination optical system 5 irradiating a photomask 2 with the laser beam in a state where a phase of the laser beams is changed and brightness distribution of the laser beam is uniformized and a defect detection device (central operating unit 2) detecting an image of the photomask by an accumulation-type sensor 17 while the laser beam and the photomask 2 are relatively moved, taking out an output signal from the accumulation-type sensor 17 in connection to the movement, forming a picture of the mask and detecting the defect of the mask pattern based on the picture of the mask.

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