发明名称 GLASS PARTICULATE DEPOSITION METHOD AND APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a method and an apparatus in which, on producing an article while feeding a gas, the gas can be fed without providing level difference in a gas flow rate when a flow rate controller provided on a gas feed line is switched, and to provide a glass particulate deposition method and an apparatus therefor by which such gas feed can be realized. SOLUTION: In the middle of piping feeding a gas from one gas feed source to a production apparatus, a plurality of flow rate controllers is provided in parallel. Further, at the downstream side, a flow rate monitoring apparatus is provided. Only the one flow rate controller is used for the gas feed. On switching from the one flow rate controller to the other flow rate controller, the actual flow rate of the gas fed by the one flow rate controller is measured with a flow rate monitor. The measured value is fed-back so as to be the flow rate set value of the other flow rate controllers. The glass particulate deposition method and apparatus are thus constituted. COPYRIGHT: (C)2004,JPO
申请公布号 JP2004155614(A) 申请公布日期 2004.06.03
申请号 JP20020322509 申请日期 2002.11.06
申请人 SUMITOMO ELECTRIC IND LTD 发明人 FUJIMOTO KAZUNORI;HIRANO NOBUYUKI
分类号 C03B8/04;(IPC1-7):C03B8/04 主分类号 C03B8/04
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