发明名称 SUBSTRATE PROCESSING METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To reduce contamination from the atmosphere when opening a container, shorten time of vacuum exhaust, and accordingly shorten a manufacturing time of an electron source or the like, in a substrate processing method to form an air-tight atmosphere with a substrate and the container covering the substrate, and to apply a prescribed processing to the substrate in the air-tight atmosphere. <P>SOLUTION: When the substrate 4 and the container 6 are separated, an air curtain is formed by blowing inactive gas or dry air into this separated region with a gas blowing jig 30. <P>COPYRIGHT: (C)2004,JPO&NCIPI</p>
申请公布号 JP2004207125(A) 申请公布日期 2004.07.22
申请号 JP20020376882 申请日期 2002.12.26
申请人 CANON INC 发明人 KATAOKA YUKINORI
分类号 H01J9/02;(IPC1-7):H01J9/02 主分类号 H01J9/02
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