| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and apparatus for manufacturing a grating that reduce the effect by reflection and have superior mass productivity in the method of manufacturing the grating by a phase masking method. SOLUTION: In the method of manufacturing the grating by the phase masking method, the angle that is made by the incidence direction of the interference light, which is projected into a plane whose normal is a grating vector of the grating preformed in a phase mask, with the normal to the phase mask side is made larger than 0 degree and smaller than 60 degrees, so that the reflection light generated at the backside and surface of the phase mask can be separated from main light. Consequently, the grating is formed in a core by using the interference light consisting of only the main light, thereby reducing the effect of the reflection light and manufacturing the grating with high quality. Also, an anti-reflection film becomes unnecessary so that the apparatus for manufacturing the grating is provided which is superior in the mass productivity. COPYRIGHT: (C)2005,JPO&NCIPI |
