| 摘要 |
A lower clad, cores, and an upper clad are formed by a chemical vapor deposition method (CVD method). At least one of the additional amount of oxygen, the additional amount of nitrogen, and the additional amount of silicon of a silicon oxynitride film is adjusted so that the cores have a desired higher refractive index than those of the clads. Further, end point detectors are formed which become etching stoppers of dry etching in pattern forming the cores. |
