发明名称 |
Thin film transistor substrate |
摘要 |
A thin film transistor substrate includes a gate electrode disposed on a substrate; a semiconductor layer disposed on the substrate that partially overlaps the gate electrode and includes an oxide semiconductor material; and a source electrode and a drain electrode disposed on the semiconductor layer, where the drain electrode is spaced apart from the source electrode. The source electrode and the drain electrode each include a barrier layer and a main wiring layer, the a main wiring layer is disposed on the barrier layer, and the barrier layer includes a first metal layer disposed on the semiconductor layer, and a second metal layer disposed on the first metal layer. |
申请公布号 |
US9502579(B2) |
申请公布日期 |
2016.11.22 |
申请号 |
US201514717734 |
申请日期 |
2015.05.20 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
Kim Bong-Kyun;Yoon Seung-Ho;Choi Shin-Il |
分类号 |
H01L29/12;H01L29/786;H01L29/417;H01L27/12;H01L23/532;H01L29/66 |
主分类号 |
H01L29/12 |
代理机构 |
F. Chau & Associates, LLC |
代理人 |
F. Chau & Associates, LLC |
主权项 |
1. A thin film transistor substrate, comprising:
a gate electrode disposed on a substrate; a semiconductor layer disposed on the substrate that partially overlaps the gate electrode and includes an oxide semiconductor; a source electrode and a drain electrode disposed on the semiconductor layer, wherein the drain electrode is spaced apart from the source electrode; and a capping layer disposed on the main wiring layer and that includes a transparent conductive oxide, wherein the source electrode and the drain electrode each include a barrier layer and a main wiring layer disposed on the barrier layer, and wherein the barrier layer includes a first metal layer disposed on the semiconductor layer and a second metal layer disposed on the first metal layer. |
地址 |
Yongin, Gyeonggi-Do KR |