发明名称 Stage alignment apparatus and its control method, exposure apparatus, and semiconductor device manufacturing method
摘要 A stage alignment apparatus includes a first moving member which can move in a first direction, a second moving member which can move in a second direction different from the first direction, a stage which is slidably supported by the first moving member and the second moving member and is guided in the first and second directions, a first control section which controls a posture, in a third direction different from the first and second directions, of the first moving member, and a second control section which controls a posture, in the third direction, of the second moving member on the basis of a signal which controls the posture of the first moving member. The second control section controls the posture of the second moving member on the basis of a signal which controls the posture of the first moving member filtered by a predetermined filter.
申请公布号 US6975383(B2) 申请公布日期 2005.12.13
申请号 US20030368621 申请日期 2003.02.20
申请人 CANON KABUSHIKI KAISHA 发明人 MORISADA MASAHIRO
分类号 B23Q5/28;G03F7/20;G03F9/00;H01L21/00;H01L21/027;H01L21/68;(IPC1-7):G03B27/42;G03B27/58;G05B11/00 主分类号 B23Q5/28
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