发明名称 |
FinFET isolation structure and method for fabricating the same |
摘要 |
A semiconductor device includes a semiconductor device and a semiconductor fin on the semiconductor substrate, in which the semiconductor fin has a fin isolation structure at a common boundary that is shared by the two cells. The fin isolation structure has an air gap extending from a top of the semiconductor fin to a portion of the semiconductor substrate. The air gap divides the semiconductor fin into two portions of the semiconductor fin. The fin isolation structure includes a dielectric cap layer capping a top of the air gap. |
申请公布号 |
US9496363(B1) |
申请公布日期 |
2016.11.15 |
申请号 |
US201514883445 |
申请日期 |
2015.10.14 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
Chang Che-Cheng;Lin Chih-Han |
分类号 |
H01L21/02;H01L29/51;H01L29/78;H01L29/66 |
主分类号 |
H01L21/02 |
代理机构 |
Maschoff Brennan |
代理人 |
Maschoff Brennan |
主权项 |
1. A semiconductor device, comprising:
a semiconductor substrate; a semiconductor fin on the semiconductor substrate; and two cells adjacent to each other on the semiconductor fin, the semiconductor fin having a fin isolation structure at a common boundary that is shared by the two cells, the fin isolation structure having an air gap extending from a top of the semiconductor fin to a portion of the semiconductor substrate, wherein the air gap divides the semiconductor fin into two portions of the semiconductor fin, the fin isolation structure comprising a dielectric cap layer capping a top of the air gap. |
地址 |
Hsinchu TW |