| 摘要 |
During a scanning exposure a support structure is moveable relative to a beam of radiation conditioned by an illuminator along a scanning path, and a substrate table is movable relative to the patterned radiation beam along a scanning path. An image transformation optic is arranged between the support structure and the substrate table. The image transformation optic is movable so as to control the characteristics of the image formed on the substrate such that the image can be transformed between a first configuration and a second configuration, the second configuration being inverted relative to the first configuration in a direction along the scanning path. |
