发明名称 PRETREATMENT BEFORE PHYSICAL VAPOR DEPOSITION
摘要 PURPOSE:To make a ceramic layer free from pinhole by irradiating electron beams on the surface of metal, ceramics or org. matter to improve the adhesive strength by pretreatment when ceramics is physically vapor-deposited on the surface in a vapor phase. CONSTITUTION:Electron beams of about 1.5kW are irradiated on the surface of metal, ceramics or org. matter under scanning. Since this method gives a higher power density than conventional ion bombardment, significant heating and cleaning effects are produced on the irradiated body in a short time, so oil and oxide layers which can not be removed by the conventional method are removed. After carrying out the pretreatment, ceramics is physically vapor-deposited on the pretreated surface in a vapor phase as usual.
申请公布号 JPS6089562(A) 申请公布日期 1985.05.20
申请号 JP19830195530 申请日期 1983.10.19
申请人 SUMITOMO DENKI KOGYO KK 发明人 OOTSUKA AKIRA;KANEHIRO KAZUO;TSUJIOKA MASANORI
分类号 C04B41/87;C23C14/02 主分类号 C04B41/87
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