发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 <p>PURPOSE:To prevent the lowering of withstanding voltage against a high-voltage power supply terminal (a Vpp terminal), and to obviate even the breaking of a transistor by utilizing a diode having MOS structure and changing the breakdown voltage of the diode on the non-application of a power supply and on application thereof. CONSTITUTION:Breakdown voltage is brought to the lowermost value when gate voltage VG is zero V in a diode D1, with has structure, in which a source in the source and a drain for an MOS transistor is removed, and a gate thereof is controlled. That is, the gate is brought to zero V and broken down at low voltage and an internal circuit is protected from static electricity when a power supply is not applied, and the gate 4 is brought to supply potential and breakdown voltage is increased and the withstanding voltage of Vpp is improved when the power supply Vpp (such as 20V) is applied normally.</p>
申请公布号 JPS60207366(A) 申请公布日期 1985.10.18
申请号 JP19840063585 申请日期 1984.03.31
申请人 TOSHIBA KK 发明人 IWAHASHI HIROSHI
分类号 G11C17/00;G11C16/06;H01L21/822;H01L21/8234;H01L21/8247;H01L27/02;H01L27/04;H01L27/088;H01L27/115;H01L29/788;H01L29/792 主分类号 G11C17/00
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