| 摘要 |
PURPOSE:To improve the surface treating effect by making radiation rays from light source incident effectively on a reaction chamber in various surface treatments of a base material surface by photochemical activation or glow discharge decomposition of gas. CONSTITUTION:Cylindrical metal mesh electrodes 37, 38 are arranged concentrically in a cylindrical vacuum vessel 30, a base plate holder 50 attached with plural base plates 51a-51c to be surface-treated is arranged between the inner wall of the vessel 30 and the electrode 37, and these are heated to a prescribed temp. by a heater 60. The inside of the chamber 30 is decompressed to vacuum, gaseous Ar and a reaction gas such as silane are supplied from an emission chamber gas introducing system 31 and a reaction gas introducing system 32 respectively. Next, high pressure AC voltage is impressed on both electrodes 37, 38 by a source 35 to generate the discharge emission in a discharge space 40, and the light is irradiated to the plates 51a-51c to form an amorphous Si hydride film on the base plate surface. The radiation rays for reaction are utilized efficiently for gas decomposition reaction without being absorbed on the way because the gap between the base plate and the electrode is small. |
