| 摘要 |
A method of preparing a thin film of a semiconductor material on a substrate, in which charged microdroplets of the semiconductor material 12 or a constituent thereof are generated by electrohydrodynamic (END) extraction of the droplets from a meniscus 16 formed at an elongate tip 14 of a nozzle 11 containing the material in a molten state, the EHD extraction occurring under the influence of a high electric field produced by an extractor electrode 17 adjacent the tip 14 of the nozzle 11. The microdroplets are then accelerated away from the elongate tip 14 of the nozzle 11 to form a two-dimensional ribbon-like beam or blanket 19 of the charged microdroplets. The two- dimensional beam 19 is directed onto the trailing edge of a target 26 carried on a moving substrate 27 such that a film of the semiconductor material is formed on the substrate by deposition of the microdroplets on the trailing edge of the moving target. <IMAGE> |
