发明名称 気体処理装置及び気体処理方法
摘要 PROBLEM TO BE SOLVED: To provide a gas treatment device and a gas treatment method which effectively increase retention without complicating a structure.SOLUTION: A gas treatment device 1 includes a treatment structural body 20, a metal casing 30 which stores the treatment structural body, and a retention member 10 arranged between the treatment structural body and the casing. The retention member is made from silica fiber, has bulk density of 0.35 g/cmor greater and 0.45 g/cmor smaller, and may have retention per unit area of 6.0 N/cmor greater. Further, the retention member is made from alumina fiber, have bulk density of 0.35 g/cmor greater and 0.45 g/cmor smaller, and may have retention per unit area of 4.15 N/cmor greater.
申请公布号 JP6017833(B2) 申请公布日期 2016.11.02
申请号 JP20120111869 申请日期 2012.05.15
申请人 ニチアス株式会社 发明人 佐藤 絢也;阿部 勇美;坂根 忠司;友末 信也;磯村 和俊
分类号 F01N3/28 主分类号 F01N3/28
代理机构 代理人
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