Manufacturing crystalline thin films

摘要

An energy beam 21 such as a laser beam irradiates a semiconductor layer on a sample 1 to melt the semiconductor layer, and the semiconductor layer is then allowed to recrystallise. Light radiated from the semiconductor layer is detected by a microscope 4 and a television camera 3 and this provides an indication of the melted condition of the semiconductor layer. On the basis of the detected radiated light, the irradiation conditions and other parameters can be controlled so as to produce a high quality recrystallised crystalline thin film. A second energy beam 22 can be provided to preheat the semiconductor layer on the sample 1.