ELECTROPHOTOGRAPHIC SENSITIVE BODY

摘要

PURPOSE:To form a flat amorphous silicon photosensitive body prevented from curling by forming an anticurl layer specified in thickness upper the amorphous silicon photoconductive layer. CONSTITUTION:The anticurl layer 5 having a film thickness of 5-200nm is formed upper the amorphous silicon photoconductive layer 4 of the photosensitive body 1, and this anticurl layer 5 is made of silicon nitride and formed by the plasma CVD method at a substrate temperature of 100-250 deg.C. Residual stress remains in the compression direction in the photoconductive layer 4, but residual stress remains in the tension direction in the anticurl layer 5, thus permitting both residual stresses to cancel each other and curling to be prevented in the photosensitive body and the flat and unpeelable photosensitive body 1 to be formed.