METHOD AND APPARATUS FOR ALIGNMENT ARRANGING MASK AND SUBSTRATE MUTUALLY

摘要

A method and an arrangement for aligning relative to each other a mask pattern (C) and a substrate (W) which are both provided with two alignment marks wherein by using two separate alignment systems (AS1, AS2) which are each associated with one mask mark (M1, M2) and which are each used for aligning the substrate marks (P1, P2) relative to said mask marks the substrate (W) and the mask (M) can be aligned accurately without referring to the frame of the exposure apparatus and in addition it is possible to detect magnification errors.